French, R. H.(2004).Origins and Applications of London Dispersion Forces and Hamaker Constants in Ceramics.Journal of the American Ceramic Society,83, 2117–2146.
Tan, G., Lemon, M., & French, R. H.(2004).Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry.Journal of the American Ceramic Society,86, 1885–1892.
Synowicki, R., Pribil, G., Cooney, G., Herzinger, C., Green, S., French, R. H., Yang, S. H., Burnett, J. H., & Kaplan, S. H.(2004).Fluid refractive index measurements using rough surface and prism minimum deviation techniques.Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures,22, 3450.
Van Benthem, K., Tan, G., Denoyer, L., French, R. H., & Ruhle, M. H.(2004).Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries.Physical Review Letters,93
Du, K., Ernst, F., Ikuhara, Y., & Pirouz, P.(2004).Preferred Intercrystalline Orientation Relationships and the Near Coincidence of Reciprocal Lattice Points..
Oba, F., Liu, R., Yu, Y., Bohannan, E., Ernst, F., & Switzer, J.(2004).TEM Studies of Cu2O–Si and Cu2O–InP Interfaces Made by Epitaxial Electrodeposition..
Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H.(2004).157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons.Proceedings of SPIE.
French, R. H., Yang, S. H., Lemon, M. H., Synowicki, R. H., Pribil, G. H., Cooney, G. H., Herzinger, C. H., Green, S. H., Burnett, J. H., & Kaplan, S. H.(2004).Immersion fluid refractive indices using prism minimum deviation techniques.Proceedings of SPIE.
Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R. H., Kao, C. H., Mawn, M. H., Lin, L. H., Wetmore, P. H., Krukonis, V. H., & Williams, K. H.(2004).Transparent fluids for 157-nm immersion lithography.Journal of Microlithography, Microfabrication, and Microsystems,3, 73.
Lyutovich, K., Oehme, M., & Ernst, F.(2004).Growth of Ultra-Thin and Highly Relaxed SiGe Layers Under In-Situ Introduction of Point Defects.European Physical Journal of Applied Physics,27, 341.
Adelung, R., Ernst, F., Zheng, N., & Landau, U.(2004).In-situ Nanoscale Observation and Control of Electron-Beam-Induced Cluster Formation.Journal of Vacuum Science and Technology B,22, 1797-1802.
Percec, S., Getty, R., Marshall, W., , G., & French, R. H.(2003).Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat.Journal of Polymer Science Part A: Polymer Chemistry,42, 541–550.
French, R. H.(2003).Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency.Journal of Fluorine Chemistry,122, 63–80.
Lustig, S., Boyes, E., French, R. H., Gierke, T. H., Harmer, M. H., Hietpas, P. H., Jagota, A. H., Mclean, S. H., Mitchell, G. H., Onoa, G. H., & Sams, K. H.(2003).Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality.Nano Letters,3, 1007–1012.
Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H.(2003).Single layer fluropolymer resists for 157-nm lithography.Proceedings of SPIE.
Adelung, R., Kunz, R., Ernst, F., Kipp, L., & Skibowski, M.(2003).Self-Organized Structures on Flat Crystals: Nanowire Networks Formed by Metal Evaporation.Advances in Solid State Physics,43, 463–476.
Liu, R., Oba, F., Bohannan, E., Ernst, F., & Switzer, J.(2003).Epitaxial Electrodeposition of Cu2O Films onto InP(001).Applied Physics Letters,83, 1944-1946.
Liu, R., Oba, F., Bohannan, E., Ernst, F., & Switzer, J.(2003).Shape Control in Epitaxial Electrodeposition: Cu2O Nanocubes on InP(001).Chemistry of Materials,15, 4882-4885.
