Brunner, K., Miesner, C., Abstreiter, G., Kienzle, O., & Ernst, F.(2000).Self-Organized Periodic Arrays of SiGe Wires and Ge Islands on Miscut Si Substrates.Physica A,7, 881–886.
Schmidt, O., Denker, U., Eberl, K., Kienzle, O., & Ernst, F.(2000).Effect of Overgrowth Temperature on the Photoluminescence of Ge/Si Islands.Applied Physics Letters,77, 2509–2511.
Gödecke, T., Haalboom, T., & Ernst, F.(2000).Phase Equilibria of Cu–In–Se: I. Stable States and Non-Equilibrium States of the In2Se3–Cu2Se Subsystem.Zeitschrift für Metallkunde,91, 622–634.
Eberl, K., Schmidt, O., Kienzle, O., & Ernst, F.(2000).Preparation and Optical Properties of Ge and C-induced Ge Dots on Si.Thin Solid Films,373, 164-169.
Lyutovich, K., Kasper, E., Ernst, F., Bauer, M., & Oehme, M.(2000).Relaxed SiGe Buffer Layer Growth with Point Defect Injection.Materials Science and Engineering B,71, 14–19.
French, R. H., Francis Carcia, P. H., Hughes, G. H., Torardi, C. H., Reynolds, G. H., & Dieu, L. H.(1999).Thin Films for Phase-shift Masks.Vaccum and Thin Film.
French, R. H., Francis Carcia, P. H., Reynolds, G. H., Hughes, G. H., Torardi, C. H., Jones, D. H., & Dieu, L. H.(1999).Optical superlattices as phase-shift masks for microlithography.Proceedings of SPIE,3790
Han, W., Redlich, P., Ernst, F., & Rühle, M.(1999).Formation of (BN)xCy and BN Nanotubes Filled with Boron Carbide Nanowires.Chemistry of Materials,11, 3620–3623.
Lyutovich, K., Ernst, F., Kasper, E., Bauer, M., & Oehme, M.(1999).Interaction Between Point Defects and Dislocations in SiGe.Solid State Phenomena,69–79, 179–184.
Ernst, F., Kienzle, O., & Rühle, M.(1999).Structure and Composition of Grain Boundaries in Ceramics.Journal of the European Ceramic Society,19, 665–673.
Kienzle, O., Ernst, F., Rühle, M., Schmidt, O., & Eberl, K.(1999).Germanium “Quantum Dots” Embedded in Silicon: Quantitative TEM Study of Self-Alignment and Coarsening.Applied Physics Letters,74, 269–271.
Baither, D., Ernst, F., Wagner, T., Rühle, M., Bartsch, M., & Messerschmidt, U.(1999).Micromechanisms of Fracture in NiAl, Studied by in situ HVEM.Intermetallics,9, 479–489.
